Atomic Layer Deposition

Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

MEMS/NEMS

Microelectro-mechanical systems contain 3-D moving components. For proper and durable functioning of these components, various thin film coatings are needed. Many metal, nitride and oxide films by atomic layer deposition are perfect candidates for this application. Metal films have been used as conductive layer. High-k oxide films have been use as dielectric layer on moving electrodes, hydrophobic/anti-adhesion layer, mask layer for etching and optical layer. Specifcally, ALD films have been incorporated in devices like MEMS mirrors, TMOS, accelarometers, prssure sensors, etc.