Atomic Layer Deposition

Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

Antireflective coatings

Antireflective coating is an important component in optics.AR coating is usually formed by high/low refractive index double layers, e.g. ZrO2-SiO2 and TiO2-SiO2. In the past, thin AR coatings were usually made by evaporation. The precision in thickness control for the double-layer is the major factor to affect the effectiveness in antiflective coating. For film thickness within 100nm, the thickness variation for evaporation is as high as 10-15%, which greatly lowers the quality of the coating. In contrast, atomic layer depositon can produce coating on complex surface stuctures with better than 1% uniformity with high reproducibility.