Atomic Layer Deposition

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Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

Optical filters

Since 1998, atomic layer deposition has become a major coating technology for multilayer optical dielectrics. ALD ZnS-Al2O3 high/low refractive index double-layer has been used to make Fabry-Perot filter, antireflective coating and high reflection coating.

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