Atomic Layer Deposition

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Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

Moisture barrier for OLED

Organic materials inside an OLED device can be oxidized due to moisture or oxygen ingression. A thin layer of Al2O3 by atomic layer deposition can effectively prevent this corrosion effect. Besides being used as a moisture barrier, ALD oxides can serve as a transparent conductive electrode. ALD ZnO gate electrode has been successfully made for OLED devices.  

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