Atomic Layer Deposition

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Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

Thin film electroluminescent components

Recent scientific publications have reported zinc-blende ZnSe thin films made by atomic layer deposition with Zn and Se precursors. Some literature has also reported successful fabrication of SrS:Cu electroluminescence component by ALD.