Atomic Layer Deposition

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Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

Solar cells

Atomic layer deposition is being rapidly adopted in mass-production of high efficiency solar panels for both cystalline Si and thin film technologies. ALD buffer layers, ZnO, ZnS, ZnSxO1-x, ZnxMg1-xO, In2S3, etc., have been shown to improve efficiency in Cu(In,Ga)Se2 thin film solar cells. ALD Al2O3 has been used as a passivation layer for cystalline Si  solar cells.  In dye-sensitized solar cells, silver nano particles with ALD TiO2 coating can significantly boot device efficiency.

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