Atomic Layer Deposition

Due to high controllability of deposition parameters (thickness; composition and structure), excellent uniformity and consistency, atomic layer deposition has gained broad applications micro/nanoelectronics and nanomaterials. Below is one of the major applications:

Metal interconnnect line

IC has seen continued trend in shrinking feature size and 3-dimentionalization. This requires thinner, more precise metal interconnect lines with better conformality. Both Cu and W need to be deposited to trenches with high aspect ratio. The 100% conformality of atomic layer deposition has made this possible. 

Materials in this category include: Cu, W, Ru, etc.