Atomic Layer Deposition

Atomic layer deposition is a layer-by-layer deposition technique. In a deposition cycle, each precursor is sequentially pulsed into the chamber and precursors react on surface to form a layer. Due to self-limiting precursor chemisorption, accurate thickness control down to atomic level is achieved. 

Atomic layer deposition has enabled ultra-thin films with excellent uniformity and controllability. The evolution of nanotechnology and semiconductor microelectronics has led to continued shrinkage in feature sizes along with increasing aspect ratio in device structures, which requires